![]() This method guarantees a simple transfer process and allows the reuse of growth substrates, without involving any hazardous etchants. Using this method, the MoS 2 films can be transferred from all substrates (silica, mica, strontium titanate, and sapphire) and retains the original sample morphology and quality. Briefly, the collapse of ultrasonication-generated microbubbles at the interface between polymer-coated MoS 2 film and substrates induce sufficient force to delaminate the MoS 2 films. We developed an etching-free transfer method for transferring MoS 2 films onto arbitrary substrates by using ultrasonication. Moreover, it remains a great challenge to avoid sample degradation and substrate destruction, because the current transfer method inevitably employs a wet chemical etching process. ![]() Transferring MoS 2 films from growth substrates onto target substrates is a critical issue for their practical applications.
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